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Low temperature deposition of metal carbide films from single source precursors

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Low temperature deposition of metal carbide films from single source precursors

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Author: Rubiano, Rodrigo R. (Rubiano Ray)
Department: Massachusetts Institute of Technology. Dept. of Nuclear Engineering; Massachusetts Institute of Technology. Dept. of Materials Science and Engineering
Publisher: Massachusetts Institute of Technology
Date Issued: 1994
Description:
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Nuclear Engineering, 1994, and Thesis (B.S.)--Massachusetts Institute of Technology, Dept. of Materials Science & Engineering, 1994.Includes bibliographical references (leaves 71-73).
URI: http://hdl.handle.net/1721.1/34692
Keywords: Nuclear Engineering, Materials Science and Engineering

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