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Focused Ion Beam Fabrication

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Focused Ion Beam Fabrication

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Author: Melngailis, John; Lezec, Henri J.; Mahoney, Leonard J.; Jacobs, Jarvis B.; Lowther, Rex E.; Musil, Christian R.; Antoniadis, Dimitri A.; Shedd, Gordon M.; Dubner, Andrew D.; Thompson, Carl V.; Barrett, J. L.; Thompson, W. B.
Publisher: Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)
Date Issued: 1987-01
Description:
Contains reports on five research projects.
URI: http://hdl.handle.net/1721.1/57005
Other Identifiers: RLE_PR_129_03
Is Part Of: Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1987
Focused Ion Beam Fabrication
Series/Report no.: Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 129
Keywords: Focused Ion Beam Fabrication, Focused Ion Beam Program, Fabrication of Graded Channel FETs in GaAs, Fabrication of Graded Channel FETs in Si, Ion Induced Deposition, Focused Ion Beam Microsurgery for Electronics, Measurement of Beam Profile

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