Microstructural Evolution in Thin Films of Electronic Materials

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Microstructural Evolution in Thin Films of Electronic Materials

Author: Thompson, Carl V.; Liu, Yachin; Floro, Jerrold A.; Inglefield, Heather E.; Frost, Harold J.; Evans, Paul; Smith, David A.; Ma, En; Miura, H.; Tu, King-Ning; Cho, Jaeshin; Kahn, Harold; Longworth, Hai P.; Melngailis, John; Dubner, Andrew D.; Ro, Jaesang; Edell, David J.

Citable URI: http://hdl.handle.net/1721.1/57156

Publisher: Research Laboratory of Electronics (RLE) at the Massachusetts Institute of Technology (MIT)

Date Issued: 1990-01-01

Description:

Contains reports on eight research projects and a list of publications.

URI: http://hdl.handle.net/1721.1/57156

Other Identifiers: RLE_PR_133_01_01s_02

Is Part Of: Massachusetts Institute of Technology, Research Laboratory of Electronics, Progress Report, January 1 - December 31, 1990
Solid State Physics, Electronics and Optics
Materials and Fabrication
Microstructural Evolution in Thin Films of Electronic Materials

Series/Report no.: Massachusetts Institute of Technology. Research Laboratory of Electronics. Progress Report, no. 133

Keywords: Microstructural Evolution in Thin Films of Electronic Materials, Coarsening of Particles on a Planar Substrate, Epitaxial Grain Growth, Modeling of Microstructural Evolution in Thin Films, Properties of Grain Boundaries in Zone Melted Silicon Thin Films, Kinetics of Thin Film Silicide Form ation, Reliability of Interconnects, Microstructures of Interconnects, Focused Ion Beam Induced Deposition, Protective Coatings for Integrated Circuits in an in vitro Environment, Publications

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