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dc.contributor.advisorKarl K. Berggren.en_US
dc.contributor.authorKorre, Hasanen_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.en_US
dc.date.accessioned2011-04-04T17:43:16Z
dc.date.available2011-04-04T17:43:16Z
dc.date.copyright2010en_US
dc.date.issued2010en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/62105
dc.descriptionThesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2010.en_US
dc.descriptionCataloged from PDF version of thesis.en_US
dc.descriptionIncludes bibliographical references (p. 61-63).en_US
dc.description.abstractInterference lithography is a technique for making one- and two-dimensional periodic nanostructures using interference of two coherent light beams. Despite their successes, the size, maintenance, and cost of interference lithography tools have prevented periodic nanostructures from being ubiquitous in academia and industry. Here, a novel approach is described whereby the conventional optical source - a bulky and expensive metal-vapor laser - is replaced by a newly available, low-cost blue laser diode. Additionally, the passive alignment of a lens tube is utilized to simplify the construction of a spatial filter. The resulting custom-built interference lithography tool is able to print large-area (~ cm2 ) periodic patterns. The tool has a small footprint (~0.2 M2 ) and can be assembled for less than 6000 USD.en_US
dc.description.statementofresponsibilityby Hasan Korre.en_US
dc.format.extent63 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Science.en_US
dc.titleOn the development of a low-cost lithographic interferometeren_US
dc.typeThesisen_US
dc.description.degreeS.M.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc707936872en_US


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