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Sub-10-nm lithography with light-ion beams

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dc.contributor.advisor Karl K. Berggren. en_US
dc.contributor.author Winston, Donald, Ph. D. Massachusetts Institute of Technology en_US
dc.contributor.other Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. en_US
dc.date.accessioned 2012-07-02T15:47:56Z
dc.date.available 2012-07-02T15:47:56Z
dc.date.copyright 2012 en_US
dc.date.issued 2012 en_US
dc.identifier.uri http://hdl.handle.net/1721.1/71495
dc.description Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012. en_US
dc.description Cataloged from PDF version of thesis. en_US
dc.description Includes bibliographical references (p. 203-212). en_US
dc.description.abstract Scanning-electron-beam lithography (SEBL) is the workhorse of nanoscale lithography in part because of the high brightness of the Schottky source of electrons, but also benefiting from decades of incremental innovation and engineering of apparatus around the Schottky source. Light ions are an attractive intermediary between electrons and heavy ions in terms of exposure efficiency and resolution by attaining a minimal interaction volume within the resist layer, if only we had bright sources of these light ions and could thus achieve small spot sizes. In this thesis, I present sub-10-nm lithography at high exposure efficiency using the gas field ionization source (GFIS) with helium and neon ions. I also present preliminary results using the magnetooptical trap ion source (MOTIS) with lithium ions. This work has also challenged the understanding of exposure efficiency as directly proportional to the so-called stopping power of incident beam particles - i.e. the average energy loss per unit path length, particularly for thin (less than 20 nm thick) resist. Values of stopping power are readily obtained via the popular Stopping and Range of Ions in Matter (SRIM) software for a variety of beam species and target materials at various landing energies, making this metric particularly convenient for predicting exposure efficiency. However, the exposure efficiency of neon ions for thin hydrogen silsesquioxane (HSQ) resist on bulk silicon is similar to that of gallium ions at 20-30 keV landing energy despite SRIM indicating a much larger stopping power for the gallium ions. Separating stopping power into nuclear and electronic components reveals that both the neon and gallium ions have similar electronic stopping powers. This correspondence points to electronic stopping power as a better indication of exposure efficiency in ion beam lithography. Unfortunately, the use of electronic stopping power alone to predict exposure efficiency has too been challenged by the data. Whereas the exposure efficiencies of neon and gallium ions were much higher than that of helium ions for the landing energies studied, the electronic stopping powers were all similar. One interpretation of this anomaly is that slower ions, i.e. neon and gallium ions in this case, for the same total energy dissipated via ionization per unit path length, produce a redshifted secondary-electron (SE) spectrum (with a correspondingly larger number of SEs), and that these lower-energy SEs are more efficient at exposure of resist. Such a phenomenon would be hidden by reliance on a single number, the electronic stopping power, to predict exposure efficiency. In addition to demonstrating sub-10-nm lithography at high exposure efficiency with light-ion beams, this thesis provides data toward predicting exposure efficiency in charged-particle-beam lithography in a way that is as simple as possible, but not simpler, using point exposures in a thin-film, high-contrast resist process. In contrast with SEBL, the lithographic techniques presented in this thesis are at their infancy. With further development, light-ion-beam lithography may serve as a useful complement to SEBL for nanofabrication in a wide variety of contexts. en_US
dc.description.statementofresponsibility by Donald Winston. en_US
dc.format.extent 212 p. en_US
dc.language.iso eng en_US
dc.publisher Massachusetts Institute of Technology en_US
dc.rights M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. en_US
dc.rights.uri http://dspace.mit.edu/handle/1721.1/7582 en_US
dc.subject Electrical Engineering and Computer Science. en_US
dc.title Sub-10-nm lithography with light-ion beams en_US
dc.type Thesis en_US
dc.description.degree Ph.D. en_US
dc.contributor.department Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. en_US
dc.identifier.oclc 795584096 en_US


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