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dc.contributor.advisorTomás Palacios.en_US
dc.contributor.authorLu, Bin, Ph. D. Massachusetts Institute of Technologyen_US
dc.contributor.otherMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.en_US
dc.date.accessioned2013-11-18T19:12:43Z
dc.date.available2013-11-18T19:12:43Z
dc.date.copyright2013en_US
dc.date.issued2013en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/82354
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2013.en_US
dc.descriptionCataloged from PDF version of thesis.en_US
dc.descriptionIncludes bibliographical references (p. 209-219).en_US
dc.description.abstractAlGaN/GaN-based high-electron-mobility transistors (HEMTs) have great potential for their use as high efficiency and high speed power semiconductor switches, thanks to their high breakdown electric field, mobility and charge density. The ability to grow these devices on large-diameter Si wafers also reduces device cost and makes them easier for wide market adoption. However, the development of AlGaN/GaN-based power switches has encountered three major obstacles: the limited breakdown voltage of AlGaN/GaN transistors grown on Si substrates; the low performance of normally-off AlGaN/GaN transistors; and the degradation of device performance under high voltage pulsed conditions. This thesis studies these issues and presents new approaches to address these obstacles. The first part of the thesis studies the breakdown mechanism in AlGaN/GaN-on-Si transistors. A new quantitative model-trap-limited space-charge impact-ionization model- is developed. Based on this model, a set of design rules is proposed to improve the breakdown voltage of AlGaN/GaN-on-Si transistors. New technologies have also been demonstrated to increase the breakdown voltage of AlGaN/GaN-on-Si transistors beyond 1500 V. The second part of the thesis presents three technologies to improve the performance of normally-off AlGaN/GaN transistors. First, a dual-gate normally-off MISFET achieved high threshold voltage, high current and high breakdown voltage simultaneously by using an integrated cascode structure. Second, a tri-gate AlGaN/GaN MISFET demonstrated the highest current on/off ratio in normally-off GaN transistors with the enhanced electrostatic control from a tri-gate structure. Finally, a new etch-stop barrier structure is designed to address low channel mobility, high interface density and non-uniformity issues associated with the conventional gate recess technology. Using this new structure, normally-off MISFETs demonstrated high uniformity, steep sub-threshold slope and a record channel effective mobility. The thesis concludes with a new dynamic on-resistance measurement technique. With this method, the hard- and soft-switching characteristics of GaN transistors were measured for the first time.en_US
dc.description.statementofresponsibilityby Bin Lu.en_US
dc.format.extent219 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Science.en_US
dc.titleAlGaN/GaN-based power semiconductor switchesen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc861744573en_US


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