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Application of quantum chemistry calculations in modeling chemical vapor deposition processes

dc.contributor.advisorKlavs F. Jensen.en_US
dc.contributor.authorSimka, Harsono Siem, 1969-en_US
dc.date.accessioned2005-08-19T12:00:00Zen_US
dc.date.available2005-08-19T12:00:00Zen_US
dc.date.copyright1998en_US
dc.date.issued1998en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/10065
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1998.en_US
dc.descriptionIncludes bibliographical references.en_US
dc.description.statementofresponsibilityby Harsono Siem Simka.en_US
dc.format.extent238 leavesen_US
dc.format.extent15267951 bytes
dc.format.extent15267711 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectChemical Engineeringen_US
dc.titleApplication of quantum chemistry calculations in modeling chemical vapor deposition processesen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.identifier.oclc39171401en_US


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