Doubling of block copolymer line patterns by electron-beam-fabricated templates
Author(s)Oser, Kameron L
Doubling of BCP line patterns by electron-beam-fabricated templates
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.
Karl K. Berggren.
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The doubling of block copolymer (BCP) line patterns by electron-beam-fabricated template patterns is presented. Difficulties in achieving low defect self-assembly within the narrow line patterns are discussed. To address these issues, experimental approaches were investigated of narrowing the polymer's minority block through solvent annealing, and adjusting length of the polymer brush responsible for functionalizing the template lines. While narrowed polymer lines were not achieved through solvent annealing, low defect self-assembly of BCP within doubling template patterns was achieved by utilizing a polymer brush of high molecular weight (28 kg mol -1).
Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, February 2015."September 2014." Cataloged from student-submitted PDF version of thesis.Includes bibliographical references (pages 54-58).
DepartmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science.
Massachusetts Institute of Technology
Electrical Engineering and Computer Science.