Doubling of block copolymer line patterns by electron-beam-fabricated templates

Abstract

The doubling of block copolymer (BCP) line patterns by electron-beam-fabricated template patterns is presented. Difficulties in achieving low defect self-assembly within the narrow line patterns are discussed. To address these issues, experimental approaches were investigated of narrowing the polymer's minority block through solvent annealing, and adjusting length of the polymer brush responsible for functionalizing the template lines. While narrowed polymer lines were not achieved through solvent annealing, low defect self-assembly of BCP within doubling template patterns was achieved by utilizing a polymer brush of high molecular weight (28 kg mol -1).