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Interferometric lithography and selected applications

dc.contributor.advisorHenry I. Smith.en_US
dc.contributor.authorFarhoud, Maya S. (Maya Sami)en_US
dc.date.accessioned2005-08-18T20:49:08Z
dc.date.available2005-08-18T20:49:08Z
dc.date.copyright1997en_US
dc.date.issued1997en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/10457
dc.descriptionThesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.en_US
dc.descriptionIncludes bibliographical references (leaves 52-53).en_US
dc.description.statementofresponsibilityby Maya S. Fahoud.en_US
dc.format.extent62 leavesen_US
dc.format.extent4596507 bytes
dc.format.extent4596268 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectElectrical Engineering and Computer Scienceen_US
dc.titleInterferometric lithography and selected applicationsen_US
dc.typeThesisen_US
dc.description.degreeM.S.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc37658981en_US


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