| dc.contributor.advisor | L. Rafael Reif. | en_US |
| dc.contributor.author | Naik, Rajan Sharad | en_US |
| dc.date.accessioned | 2005-08-18T12:00:00Z | en_US |
| dc.date.available | 2005-08-18T12:00:00Z | en_US |
| dc.date.copyright | 1996 | en_US |
| dc.date.issued | 1996 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/11242 | |
| dc.description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996. | en_US |
| dc.description | Includes bibliographical references (leaf 43). | en_US |
| dc.description.statementofresponsibility | by Rajan Sharad Naik. | en_US |
| dc.format.extent | 43 p. | en_US |
| dc.format.extent | 2578173 bytes | |
| dc.format.extent | 2577935 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Materials Science and Engineering | en_US |
| dc.title | Sputter deposition of aluminum nitride for applications in thin-film resonators | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.S. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.identifier.oclc | 34791224 | en_US |