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dc.contributor.advisorHenry I. Smith.en_US
dc.contributor.authorMoel Modiano, Albertoen_US
dc.date.accessioned2005-08-16T21:44:15Z
dc.date.available2005-08-16T21:44:15Z
dc.date.copyright1993en_US
dc.date.issued1993en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/11991
dc.descriptionThesis (Sc. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1993.en_US
dc.descriptionIncludes bibliographical references (leaves 159-172).en_US
dc.description.statementofresponsibilityby Albert Moel Modiano.en_US
dc.format.extent172 leavesen_US
dc.format.extent10703636 bytes
dc.format.extent10703394 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectElectrical Engineering and Computer Scienceen_US
dc.titleAn aligner for X-ray nanolithographyen_US
dc.typeThesisen_US
dc.description.degreeSc.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc31178823en_US


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