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dc.contributor.advisorJohn Melngailis and Carl V. Thompson.en_US
dc.contributor.authorDella Ratta, Anthony D. (Anthony David)en_US
dc.date.accessioned2005-08-15T23:29:00Z
dc.date.available2005-08-15T23:29:00Z
dc.date.copyright1993en_US
dc.date.issued1993en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/12418
dc.descriptionThesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1993.en_US
dc.descriptionIncludes bibliographical references (leaves 94-97).en_US
dc.description.statementofresponsibilityby Anthony D. Della Ratta.en_US
dc.format.extent97 leavesen_US
dc.format.extent5909298 bytes
dc.format.extent5909054 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineeringen_US
dc.titleFocused ion beam induced deposition of copperen_US
dc.typeThesisen_US
dc.description.degreeM.S.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc29550831en_US


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