| dc.contributor.advisor | Carl V. Thompson. | en_US |
| dc.contributor.author | Longworth, Hai Pham | en_US |
| dc.date.accessioned | 2005-08-15T16:16:34Z | |
| dc.date.available | 2005-08-15T16:16:34Z | |
| dc.date.copyright | 1992 | en_US |
| dc.date.issued | 1992 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/13114 | |
| dc.description | Thesis (Sc. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1992. | en_US |
| dc.description | Includes bibliographical references (leaves 246-262). | en_US |
| dc.description.statementofresponsibility | by Hai Pham Longworth. | en_US |
| dc.format.extent | 262 leaves | en_US |
| dc.format.extent | 19103536 bytes | |
| dc.format.extent | 19103293 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Materials Science and Engineering | en_US |
| dc.title | Microstructural modification of thin films and its relation to the electromigration-limited reliability of VLSI interconnects | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Sc.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Materials Science and Engineering | |
| dc.identifier.oclc | 26408909 | en_US |
