Metalorganic chemical vapor deposition of aluminum nitride and gallium nitride

Author(s)
Ho, Kwok-Lun
Thumbnail
DownloadFull printable version (8.846Mb)
Advisor
Klaus F. Jensen.
Terms of use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582
Metadata
Show full item record
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.
 
Includes bibliographical references (leaves 147-152).
 
Date issued
1992
URI
http://hdl.handle.net/1721.1/13142
Department
Massachusetts Institute of Technology. Dept. of Chemical Engineering
Publisher
Massachusetts Institute of Technology
Keywords
Chemical Engineering
Collections