| dc.contributor.advisor | Klaus F. Jensen. | en_US |
| dc.contributor.author | Ho, Kwok-Lun | en_US |
| dc.date.accessioned | 2005-08-15T16:28:10Z | |
| dc.date.available | 2005-08-15T16:28:10Z | |
| dc.date.copyright | 1991 | en_US |
| dc.date.issued | 1992 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/13142 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992. | en_US |
| dc.description | Includes bibliographical references (leaves 147-152). | en_US |
| dc.description.statementofresponsibility | by Kwok-Lun Ho. | en_US |
| dc.format.extent | vi, 152 leaves | en_US |
| dc.format.extent | 9275950 bytes | |
| dc.format.extent | 9275708 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Chemical Engineering | en_US |
| dc.title | Metalorganic chemical vapor deposition of aluminum nitride and gallium nitride | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Chemical Engineering | |
| dc.identifier.oclc | 26572000 | en_US |
