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dc.contributor.advisorHerbert H. Sawin.en_US
dc.contributor.authorGray, David Charlesen_US
dc.date.accessioned2005-08-15T16:47:04Z
dc.date.available2005-08-15T16:47:04Z
dc.date.copyright1992en_US
dc.date.issued1992en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/13187
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1992.en_US
dc.descriptionIncludes bibliographical references (p. 376-384).en_US
dc.description.statementofresponsibilityby David Charles Gray.en_US
dc.format.extent618 p.en_US
dc.format.extent32344656 bytes
dc.format.extent32344412 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectChemical Engineeringen_US
dc.titleBeam simulation studies of plasma-surface interactions in fluorocarbon etching of Si and SiO2en_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.identifier.oclc26680838en_US


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