Sub-micron gate lithography in an MMIC production environment

Author(s)
Moran, Peter William
Thumbnail
DownloadFull printable version (11.90Mb)
Advisor
Rebecca M. Henderson and Jesús A. del Alamo.
Terms of use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582
Metadata
Show full item record
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1990, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1990.
 
Includes bibliographical references (leaves 195-197).
 
Date issued
1990
URI
http://hdl.handle.net/1721.1/13600
Department
Massachusetts Institute of Technology. Department of Electrical Engineering; Sloan School of Management; Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Publisher
Massachusetts Institute of Technology
Keywords
Sloan School of Management, Electrical Engineering
Collections