| dc.contributor.advisor | Rebecca M. Henderson and Jesús A. del Alamo. | en_US |
| dc.contributor.author | Moran, Peter William | en_US |
| dc.date.accessioned | 2005-08-10T22:16:04Z | |
| dc.date.available | 2005-08-10T22:16:04Z | |
| dc.date.copyright | 1990 | en_US |
| dc.date.issued | 1990 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/13600 | |
| dc.description | Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1990, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1990. | en_US |
| dc.description | Includes bibliographical references (leaves 195-197). | en_US |
| dc.description.statementofresponsibility | by Peter William Moran. | en_US |
| dc.format.extent | 199 leaves | en_US |
| dc.format.extent | 12487268 bytes | |
| dc.format.extent | 12487026 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Sloan School of Management | en_US |
| dc.subject | Electrical Engineering | en_US |
| dc.title | Sub-micron gate lithography in an MMIC production environment | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.S. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering | en_US |
| dc.contributor.department | Sloan School of Management | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 24154943 | en_US |
