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dc.contributor.advisorCarl V. Thompson.en_US
dc.contributor.authorClevenger, Lawrence Alfreden_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Materials Science and Engineering.en_US
dc.date.accessioned2005-08-10T17:36:11Z
dc.date.available2005-08-10T17:36:11Z
dc.date.copyright1989en_US
dc.date.issued1989en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/14210
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1989.en_US
dc.descriptionIncludes bibliographical references.en_US
dc.description.statementofresponsibilityby Lawrence Alfred Clevenger.en_US
dc.format.extentii, 236 leavesen_US
dc.format.extent14735261 bytes
dc.format.extent14735017 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineering.en_US
dc.titleControlled and explosive silicidation of metal/amorphous-silicon multilayer thin filmsen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc22336037en_US


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