| dc.contributor.advisor | L. Rafael Reif and David Adler. | en_US |
| dc.contributor.author | Hajjar, Jean-Jacques Joseph | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. | en_US |
| dc.date.accessioned | 2005-08-08T16:45:34Z | |
| dc.date.available | 2005-08-08T16:45:34Z | |
| dc.date.copyright | 1985 | en_US |
| dc.date.issued | 1986 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/15006 | |
| dc.description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1986. | en_US |
| dc.description | MICROFICHE COPY AVAILABLE IN ARCHIVES AND ENGINEERING | en_US |
| dc.description | Bibliography: leaves 134-139. | en_US |
| dc.description.statementofresponsibility | by Jean-Jacques Joseph Hajjar. | en_US |
| dc.format.extent | 139 leaves | en_US |
| dc.format.extent | 7027951 bytes | |
| dc.format.extent | 7027701 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Electrical Engineering and Computer Science. | en_US |
| dc.title | Characterization of chemical vapor deposited polycrystalline silicon thin films | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.S. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 15128329 | en_US |
