Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges

Author(s)
Allen, Kenneth Donald
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Massachusetts Institute of Technology. Dept. of Chemical Engineering.
Advisor
Herbert H. Swain.
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Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1986.
 
MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE.
 
Bibliography: leaves 319-340.
 
Date issued
1986
URI
http://hdl.handle.net/1721.1/15045
Department
Massachusetts Institute of Technology. Department of Chemical Engineering
Publisher
Massachusetts Institute of Technology
Keywords
Chemical Engineering.
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