Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges
Author(s)
Allen, Kenneth Donald
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Other Contributors
Massachusetts Institute of Technology. Dept. of Chemical Engineering.
Advisor
Herbert H. Swain.
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Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1986. MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE. Bibliography: leaves 319-340.
Date issued
1986Department
Massachusetts Institute of Technology. Department of Chemical EngineeringPublisher
Massachusetts Institute of Technology
Keywords
Chemical Engineering.