| dc.contributor.advisor | Herbert H. Swain. | en_US |
| dc.contributor.author | Allen, Kenneth Donald | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Dept. of Chemical Engineering. | en_US |
| dc.date.accessioned | 2005-08-08T17:02:00Z | |
| dc.date.available | 2005-08-08T17:02:00Z | |
| dc.date.copyright | 1986 | en_US |
| dc.date.issued | 1986 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/15045 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1986. | en_US |
| dc.description | MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE. | en_US |
| dc.description | Bibliography: leaves 319-340. | en_US |
| dc.description.statementofresponsibility | by Kenneth Donald Allen. | en_US |
| dc.format.extent | 2 v. [406 leaves] | en_US |
| dc.format.extent | 19889251 bytes | |
| dc.format.extent | 19889005 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Chemical Engineering. | en_US |
| dc.title | Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Chemical Engineering | |
| dc.identifier.oclc | 15495986 | en_US |
