| dc.contributor.advisor | Ewan W. Fletcher. | en_US |
| dc.contributor.author | Reed, Francis Keith | en_US |
| dc.date.accessioned | 2005-08-04T17:23:01Z | |
| dc.date.available | 2005-08-04T17:23:01Z | |
| dc.date.issued | 1959 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/15821 | |
| dc.description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering, 1959. | en_US |
| dc.description | Includes bibliographical references (leaves 65-67). | en_US |
| dc.description.statementofresponsibility | by Francis Keith Reed. | en_US |
| dc.format.extent | 67 leaves | en_US |
| dc.format.extent | 4117466 bytes | |
| dc.format.extent | 4117224 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Electrical Engineering | en_US |
| dc.title | A heat flow problem in electron beam etching of thin films | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.S. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 08060626 | en_US |
