| dc.contributor.author | Cherkassky, Alexander (Alexander Peter), 1963- | en_US |
| dc.date.accessioned | 2005-06-02T14:46:41Z | |
| dc.date.available | 2005-06-02T14:46:41Z | |
| dc.date.copyright | 1995 | en_US |
| dc.date.issued | 1995 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/17405 | |
| dc.description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995. | en_US |
| dc.description | Includes bibliographical references (leaf 47). | en_US |
| dc.description.statementofresponsibility | by Alexander Cherkassky. | en_US |
| dc.format.extent | 47 leaves | en_US |
| dc.format.extent | 1579880 bytes | |
| dc.format.extent | 1579688 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Electrical Engineering and Computer Science | en_US |
| dc.title | Metrology of thin silicon expitaxial films : determination of epitaxial film thickness by Fourier-transform infra-red spectrometry | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.S. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 33231086 | en_US |
