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Feasibility study of spatial-phase-locked focused-ion-beam lithography

dc.contributor.advisorHenry I. Smith.en_US
dc.contributor.authorYasaka, Antoen_US
dc.date.accessioned2006-05-15T20:19:54Z
dc.date.available2006-05-15T20:19:54Z
dc.date.copyright1995en_US
dc.date.issued1995en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/32663
dc.descriptionThesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995.en_US
dc.descriptionIncludes bibliographical references (leaves 66-68).en_US
dc.description.statementofresponsibilityby Anto Yasaka.en_US
dc.format.extent68 leavesen_US
dc.format.extent3530072 bytes
dc.format.extent3532314 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineeringen_US
dc.titleFeasibility study of spatial-phase-locked focused-ion-beam lithographyen_US
dc.typeThesisen_US
dc.description.degreeM.S.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc33976490en_US


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