MIT Libraries logoDSpace@MIT

MIT
View Item 
  • DSpace@MIT Home
  • Singapore-MIT Alliance (SMA)
  • Advanced Materials for Micro- and Nano-Systems (AMMNS)
  • View Item
  • DSpace@MIT Home
  • Singapore-MIT Alliance (SMA)
  • Advanced Materials for Micro- and Nano-Systems (AMMNS)
  • View Item
JavaScript is disabled for your browser. Some features of this site may not work without it.

TiNi shape memory alloy thin films for microactuator application

Author(s)
Fu, Yongqing; Du, Hejun
Thumbnail
DownloadAMMNS031.pdf (990.8Kb)
Metadata
Show full item record
Abstract
TiNi films were prepared by co-sputtering TiNi target and a separate Ti target. Crystalline structure and phase transformation behaviors of TiNi films were investigated. Results showed that TiNi films had fine grain size of about 500 nm and fully martensitic structure at room temperature. X-ray photoelectron spectroscopy (XPS) results indicated that there is adherent and natural TiO₂ film, which is beneficial to its corrosion resistance and biocompatibillity. Results from differential scanning calorimeter (DSC), in-situ X-ray diffraction (XRD) and curvature measurement revealed clearly martensitic transformation upon heating and cooling. The TiNi films were further deposited on micromachined silicon cantilever and membrane structures in order to form micro-gripper or microvalve with large deformation due to shape-memory effect.
Date issued
2003-01
URI
http://hdl.handle.net/1721.1/3732
Series/Report no.
Advanced Materials for Micro- and Nano-Systems (AMMNS);
Keywords
TiNi thin film, sputtering, shape memory, martensitic transformation

Collections
  • Advanced Materials for Micro- and Nano-Systems (AMMNS)

Browse

All of DSpaceCommunities & CollectionsBy Issue DateAuthorsTitlesSubjectsThis CollectionBy Issue DateAuthorsTitlesSubjects

My Account

Login

Statistics

OA StatisticsStatistics by CountryStatistics by Department
MIT Libraries
PrivacyPermissionsAccessibilityContact us
MIT
Content created by the MIT Libraries, CC BY-NC unless otherwise noted. Notify us about copyright concerns.