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dc.contributor.advisorMaria Flytzani-Stephanopoulos, Robert A. Brown.en_US
dc.contributor.authorKrueger, Charles Winslowen_US
dc.date.accessioned2007-05-16T18:49:04Z
dc.date.available2007-05-16T18:49:04Z
dc.date.copyright1994en_US
dc.date.issued1994en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/37507
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1994.en_US
dc.descriptionIncludes bibliographical references (leaves 174-179).en_US
dc.description.statementofresponsibilityby Charles Winslow Krueger.en_US
dc.format.extent181 leavesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectChemical Engineeringen_US
dc.titleChemical vapor etching of GaAs by CH3Ien_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.identifier.oclc30772398en_US


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