Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes
Author(s)
Thomas, Jeffrey Wade![Thumbnail](/bitstream/handle/1721.1/38062/33342500-MIT.pdf.jpg?sequence=4&isAllowed=y)
DownloadFull printable version (22.69Mb)
Advisor
James E. Chung.
Terms of use
Metadata
Show full item recordDescription
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995. Includes bibliographical references (leaves 76-77).
Date issued
1995Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer SciencePublisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science