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dc.contributor.advisorMichel J. Cima.en_US
dc.contributor.authorChang, Bertha Pi-Juen_US
dc.date.accessioned2007-07-18T13:34:34Z
dc.date.available2007-07-18T13:34:34Z
dc.date.copyright1995en_US
dc.date.issued1995en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/38087
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1995.en_US
dc.descriptionIncludes bibliographical references (leaves 265-274).en_US
dc.description.statementofresponsibilityby Bertha Pi-Ju Chang.en_US
dc.format.extent274 leavesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMaterials Science and Engineeringen_US
dc.titleDeposition and planarization of epitaxial oxide thin films for high temperature superconducting device applicationsen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Materials Science and Engineering
dc.identifier.oclc33895507en_US


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