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dc.contributor.advisorDaniel E. Ehrlich and Anette Hosoi.en_US
dc.contributor.authorLin, Tony An-tongen_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Mechanical Engineering.en_US
dc.date.accessioned2008-01-10T15:51:42Z
dc.date.available2008-01-10T15:51:42Z
dc.date.copyright2007en_US
dc.date.issued2007en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/39886
dc.descriptionThesis (S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2007.en_US
dc.descriptionIncludes bibliographical references (p. 107-109).en_US
dc.description.abstractThe development of microfluidic devices has enabled precision control of nanoliter-scale environments and reactions. Vertical hydrodynamic focusing is one possible way to improve the optical performance of these devices while maintaining precision control. Vertical hydrodynamic focusing was studied through the use of computation fluid dynamics (ADINA) and experimental testing. It was found that the nonlinear effects of flow rate and geometry on the layering profile could be used to tune and correct the flow. A syringe pump-driven microfluidic device was fabricated out of isotropically etched and bonded glass plates and fluorescent confocal microscopy was used to verify computational models.en_US
dc.description.statementofresponsibilityby Tony An-tong Lin.en_US
dc.format.extent109 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMechanical Engineering.en_US
dc.titleVertical hydrodynamic focusing in an isotropically etched glass microfluidic deviceen_US
dc.typeThesisen_US
dc.description.degreeS.M.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineering
dc.identifier.oclc182540246en_US


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