A statistical metrology framework for characterizing ILD thickness variation in CMP processes
Author(s)
Chang, Eric Choong-Yin
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Alternative title
Statistical metrology framework for characterizing inter-level dielectric thickness variation in chemical machine polishing.
Advisor
James Chung, Duane Boning.
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Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996. Includes bibliographical references (leaf 109).
Date issued
1996Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer SciencePublisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science