A statistical metrology framework for characterizing ILD thickness variation in CMP processes
Author(s)Chang, Eric Choong-Yin
Statistical metrology framework for characterizing inter-level dielectric thickness variation in chemical machine polishing.
James Chung, Duane Boning.
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Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996.Includes bibliographical references (leaf 109).
DepartmentMassachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science
Massachusetts Institute of Technology
Electrical Engineering and Computer Science