| dc.contributor.advisor | James Chung, Duane Boning. | en_US |
| dc.contributor.author | Chang, Eric Choong-Yin | en_US |
| dc.date.accessioned | 2008-04-23T14:53:15Z | |
| dc.date.available | 2008-04-23T14:53:15Z | |
| dc.date.copyright | 1996 | en_US |
| dc.date.issued | 1996 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/41383 | |
| dc.description | Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1996. | en_US |
| dc.description | Includes bibliographical references (leaf 109). | en_US |
| dc.description.statementofresponsibility | by Eric Choong-Yin Chang. | en_US |
| dc.format.extent | 109 leaves | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Electrical Engineering and Computer Science | en_US |
| dc.title | A statistical metrology framework for characterizing ILD thickness variation in CMP processes | en_US |
| dc.title.alternative | Statistical metrology framework for characterizing inter-level dielectric thickness variation in chemical machine polishing. | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.Eng. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 35334677 | en_US |
