Absorbance modulation optical lithography

Author(s)
Tsai, Hsin-Yu Sidney
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Alternative title
AMOL
Other Contributors
Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Advisor
Henry I. Smith.
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M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/42253 http://dspace.mit.edu/handle/1721.1/7582
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Abstract
In this thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability of AMOL and matched well with simulation. Several key elements of the AMOL system are discussed: the material systems of AMOL, limitations on the material and optical systems presented, and the design and fabrication of spiral phase elements that generate ring-shaped beams required by AMOL.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2007.
 
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
 
Includes bibliographical references (p. 91-94).
 
Date issued
2007
URI
http://dspace.mit.edu/handle/1721.1/42253
http://hdl.handle.net/1721.1/42253
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Publisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science.
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