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dc.contributor.advisorHenry I. Smith.en_US
dc.contributor.authorTsai, Hsin-Yu Sidneyen_US
dc.contributor.otherMassachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.en_US
dc.date.accessioned2009-07-01T16:44:25Z
dc.date.available2009-07-01T16:44:25Z
dc.date.copyright2007en_US
dc.date.issued2007en_US
dc.identifier.urihttp://dspace.mit.edu/handle/1721.1/42253en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/42253
dc.descriptionThesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2007.en_US
dc.descriptionThis electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.en_US
dc.descriptionIncludes bibliographical references (p. 91-94).en_US
dc.description.abstractIn this thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability of AMOL and matched well with simulation. Several key elements of the AMOL system are discussed: the material systems of AMOL, limitations on the material and optical systems presented, and the design and fabrication of spiral phase elements that generate ring-shaped beams required by AMOL.en_US
dc.description.statementofresponsibilityby Hsin-Yu Sidney Tsai.en_US
dc.format.extent94 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/42253en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Science.en_US
dc.titleAbsorbance modulation optical lithographyen_US
dc.title.alternativeAMOLen_US
dc.typeThesisen_US
dc.description.degreeS.M.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc231635606en_US


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