Using statistical metrology to understand pattern-dependent ILD thickness variation in oxide CMP processes

Author(s)
Divecha, Rajesh Ramji
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Advisor
Duane Boning, James Chung.
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Description
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.
 
Includes bibliographical references (leaves 46-47).
 
Date issued
1997
URI
http://hdl.handle.net/1721.1/43508
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Publisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science
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