| dc.contributor.advisor | Duane Boning, James Chung. | en_US |
| dc.contributor.author | Divecha, Rajesh Ramji | en_US |
| dc.date.accessioned | 2008-11-07T20:06:31Z | |
| dc.date.available | 2008-11-07T20:06:31Z | |
| dc.date.copyright | 1997 | en_US |
| dc.date.issued | 1997 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/43508 | |
| dc.description | Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997. | en_US |
| dc.description | Includes bibliographical references (leaves 46-47). | en_US |
| dc.description.statementofresponsibility | by Rajesh Ramji Divecha. | en_US |
| dc.format.extent | 47 leaves | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Electrical Engineering and Computer Science | en_US |
| dc.title | Using statistical metrology to understand pattern-dependent ILD thickness variation in oxide CMP processes | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.Eng. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 38164372 | en_US |
