Variation reduction in plasma etching via run-to-run process control and endpoint detection

Author(s)
Le, Minh Sy
Thumbnail
DownloadFull printable version (8.439Mb)
Advisor
Herbert H. Sawin.
Terms of use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582
Metadata
Show full item record
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.
 
Includes bibliographical references (leaves 89-91).
 
Date issued
1997
URI
http://hdl.handle.net/1721.1/43565
Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Publisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science
Collections