Variation reduction in plasma etching via run-to-run process control and endpoint detection
Author(s)
Le, Minh Sy
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Advisor
Herbert H. Sawin.
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Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997. Includes bibliographical references (leaves 89-91).
Date issued
1997Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer SciencePublisher
Massachusetts Institute of Technology
Keywords
Electrical Engineering and Computer Science