dc.contributor.advisor | Herbert H. Sawin. | en_US |
dc.contributor.author | Le, Minh Sy | en_US |
dc.date.accessioned | 2008-11-07T20:12:39Z | |
dc.date.available | 2008-11-07T20:12:39Z | |
dc.date.copyright | 1997 | en_US |
dc.date.issued | 1997 | en_US |
dc.identifier.uri | http://hdl.handle.net/1721.1/43565 | |
dc.description | Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997. | en_US |
dc.description | Includes bibliographical references (leaves 89-91). | en_US |
dc.description.statementofresponsibility | by Minh Sy Le. | en_US |
dc.format.extent | 91 leaves | en_US |
dc.language.iso | eng | en_US |
dc.publisher | Massachusetts Institute of Technology | en_US |
dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
dc.subject | Electrical Engineering and Computer Science | en_US |
dc.title | Variation reduction in plasma etching via run-to-run process control and endpoint detection | en_US |
dc.type | Thesis | en_US |
dc.description.degree | M.S. | en_US |
dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
dc.identifier.oclc | 38551262 | en_US |