dc.contributor | Eisenstein, A. S. | en_US |
dc.date.accessioned | 2004-03-03T22:19:04Z | |
dc.date.available | 2004-03-03T22:19:04Z | |
dc.date.issued | 1946 | en_US |
dc.identifier.other | no. 17 | en_US |
dc.identifier.uri | http://hdl.handle.net/1721.1/5029 | |
dc.description | "Reprinted from Journal of applied physics, vol. 17, No. 11, 874-878, November, 1946." | en_US |
dc.description | Includes bibliographical references. | en_US |
dc.description.statementofresponsibility | [by] A. Eisenstein. | en_US |
dc.format.extent | p. 874-878 | en_US |
dc.format.extent | 487443 bytes | |
dc.format.mimetype | application/pdf | |
dc.language.iso | eng | en_US |
dc.publisher | Research Laboratory of Electronics, Massachusetts Institute of Technology | en_US |
dc.relation.ispartofseries | Technical report (Massachusetts Institute of Technology. Research Laboratory of Electronics) ; 17. | en_US |
dc.subject.lcc | TK7855.M41 R43 no.17 | en_US |
dc.subject.lcsh | Thin films | en_US |
dc.title | An x-ray method for measuring the thickness of thin crystalline films | en_US |