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dc.contributorEisenstein, A. S.en_US
dc.date.accessioned2004-03-03T22:19:04Z
dc.date.available2004-03-03T22:19:04Z
dc.date.issued1946en_US
dc.identifier.otherno. 17en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/5029
dc.description"Reprinted from Journal of applied physics, vol. 17, No. 11, 874-878, November, 1946."en_US
dc.descriptionIncludes bibliographical references.en_US
dc.description.statementofresponsibility[by] A. Eisenstein.en_US
dc.format.extentp. 874-878en_US
dc.format.extent487443 bytes
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherResearch Laboratory of Electronics, Massachusetts Institute of Technologyen_US
dc.relation.ispartofseriesTechnical report (Massachusetts Institute of Technology. Research Laboratory of Electronics) ; 17.en_US
dc.subject.lccTK7855.M41 R43 no.17en_US
dc.subject.lcshThin filmsen_US
dc.titleAn x-ray method for measuring the thickness of thin crystalline filmsen_US


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