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dc.contributor.advisorHerbert H. Sawin.en_US
dc.contributor.authorChang, Jane Pei-chen, 1967-en_US
dc.date.accessioned2010-01-07T20:30:27Z
dc.date.available2010-01-07T20:30:27Z
dc.date.copyright1998en_US
dc.date.issued1998en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/50356
dc.descriptionThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1998.en_US
dc.descriptionIncludes bibliographical references (p. 163-170).en_US
dc.description.statementofresponsibilityby Jane Pei-chen Chang.en_US
dc.format.extent218 p.en_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectChemical Engineeringen_US
dc.titleStudy of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterened polysiliconen_US
dc.typeThesisen_US
dc.description.degreePh.D.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Chemical Engineering
dc.identifier.oclc39171343en_US


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