Bilayer graphene growth by low pressure chemical vapor deposition on copper foil
Author(s)Fang, Wenjing, Ph. D. Massachusetts Institute of Technology
Bilayer graphene growth by LPCVD on copper foil
Bilayer graphene growth using coronene
Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
MetadataShow full item record
Successfully integrating graphene in standard processes for applications in electronics relies on the synthesis of high-quality films. In this work we study Low Pressure Chemical Vapor Deposition (LPCVD) growth of bilayer graphene on the outside surface of copper enclosures. The effect of several parameters on bilayer growth rate and domain size was investigated and high-coverage bilayers films were successfully grown. Furthermore, the quality of the bilayer was confirmed using Raman spectroscopy. Finally, we consider future studies that may reveal the underlying mechanisms behind bilayer growth.
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012.Cataloged from PDF version of thesis.Includes bibliographical references (p. 49-51).
DepartmentMassachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science.
Massachusetts Institute of Technology
Electrical Engineering and Computer Science.