| dc.contributor.advisor | Jing Kong. | en_US |
| dc.contributor.author | Fang, Wenjing, Ph. D. Massachusetts Institute of Technology | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. | en_US |
| dc.date.accessioned | 2012-12-13T18:49:45Z | |
| dc.date.available | 2012-12-13T18:49:45Z | |
| dc.date.copyright | 2012 | en_US |
| dc.date.issued | 2012 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/75656 | |
| dc.description | Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012. | en_US |
| dc.description | Cataloged from PDF version of thesis. | en_US |
| dc.description | Includes bibliographical references (p. 49-51). | en_US |
| dc.description.abstract | Successfully integrating graphene in standard processes for applications in electronics relies on the synthesis of high-quality films. In this work we study Low Pressure Chemical Vapor Deposition (LPCVD) growth of bilayer graphene on the outside surface of copper enclosures. The effect of several parameters on bilayer growth rate and domain size was investigated and high-coverage bilayers films were successfully grown. Furthermore, the quality of the bilayer was confirmed using Raman spectroscopy. Finally, we consider future studies that may reveal the underlying mechanisms behind bilayer growth. | en_US |
| dc.description.statementofresponsibility | by Wenjing Fang. | en_US |
| dc.format.extent | 51 p. | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Electrical Engineering and Computer Science. | en_US |
| dc.title | Bilayer graphene growth by low pressure chemical vapor deposition on copper foil | en_US |
| dc.title.alternative | Bilayer graphene growth by LPCVD on copper foil | en_US |
| dc.title.alternative | Bilayer graphene growth using coronene | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | S.M. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 818359166 | en_US |
