| dc.contributor.advisor | Aleksandar Kojic and James K. Roberge. | en_US |
| dc.contributor.author | Wang, Xiawa | en_US |
| dc.contributor.other | Massachusetts Institute of Technology. Dept. of Electrical Engineering and Computer Science. | en_US |
| dc.date.accessioned | 2013-02-14T15:36:51Z | |
| dc.date.available | 2013-02-14T15:36:51Z | |
| dc.date.issued | 2012 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/77000 | |
| dc.description | Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, February 2012. | en_US |
| dc.description | "February 2011." Cataloged from PDF version of thesis. | en_US |
| dc.description | Includes bibliographical references (p. 77-81). | en_US |
| dc.description.abstract | This thesis presents the measurement techniques and results of low-frequency noise for atomic-layer-deposition Pt films. Atomic-layer-deposition has been developed as an approach to make ultra-thin and conformal films. It has been employed to make detectors of bolometers. 1/f noise is a fundamental limit to the resolution. The experiments are designed to characterize the 1/f noise of the ALD fabricated Pt films. The measurement results show that for 7nm and 13nm ALD fabricated Pt films, 1/f noise is about two orders of magnitude larger than reported for continuous Pt films in literature. The thin film is also very likely to suffer from electromigration damage. | en_US |
| dc.description.statementofresponsibility | by Xiawa Wang. | en_US |
| dc.format.extent | 81 p. | en_US |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by
copyright. They may be viewed from this source for any purpose, but
reproduction or distribution in any format is prohibited without written
permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | en_US |
| dc.subject | Electrical Engineering and Computer Science. | en_US |
| dc.title | On the 1/f noise of atomic-layer-deposition metal films | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | M.Eng. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science | |
| dc.identifier.oclc | 825558250 | en_US |
