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dc.contributor.advisorDuane Boning and James Chung.en_US
dc.contributor.authorOji, Charles (Charles Ojih), 1974-en_US
dc.date.accessioned2013-08-22T18:52:03Z
dc.date.available2013-08-22T18:52:03Z
dc.date.copyright1999en_US
dc.date.issued1999en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/80109
dc.descriptionThesis (M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1999.en_US
dc.descriptionIncludes bibliographical references (leaves 55-56).en_US
dc.description.statementofresponsibilityby Charles Oji.en_US
dc.format.extent91 leavesen_US
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582en_US
dc.subjectElectrical Engineering and Computer Scienceen_US
dc.titleCharacterization and modeling of uniformity in chemical mechanical polishingen_US
dc.title.alternativeCharacterization and modeling in chemical mechanical polishing processesen_US
dc.typeThesisen_US
dc.description.degreeM.Eng.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
dc.identifier.oclc43556183en_US


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