A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications

Abstract

Lithography processes harnessing the phase change of the chemically inert carbon dioxide as a resist have been shown as a possible alternative to patterning thin film organic semiconductors and metals. The ability to control the resist's growth would make the lithography process more reliable and ecient. This thesis seeks to control and observe the physical properties of the carbon dioxide resist via the optical technique of dual-laser interferometry in conjunction with a quartz crystal micro balance (QCMB).