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Ice and abrasive particles : an alternative CMP polishing technique

dc.contributor.advisorNam P. Suh.en_US
dc.contributor.authorBorn, Melanie P. (Melanie Providencia), 1975-en_US
dc.date.accessioned2005-08-19T18:37:18Z
dc.date.available2005-08-19T18:37:18Z
dc.date.copyright1998en_US
dc.date.issued1998en_US
dc.identifier.urihttp://hdl.handle.net/1721.1/9570
dc.descriptionThesis (S.B.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1998.en_US
dc.descriptionIncludes bibliographical references (p. 45-46).en_US
dc.description.statementofresponsibilityby Melanie P. Born.en_US
dc.format.extent46 p.en_US
dc.format.extent3069723 bytes
dc.format.extent3069478 bytes
dc.format.mimetypeapplication/pdf
dc.format.mimetypeapplication/pdf
dc.language.isoengen_US
dc.publisherMassachusetts Institute of Technologyen_US
dc.rightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.en_US
dc.rights.urihttp://dspace.mit.edu/handle/1721.1/7582
dc.subjectMechanical Engineeringen_US
dc.titleIce and abrasive particles : an alternative CMP polishing techniqueen_US
dc.typeThesisen_US
dc.description.degreeS.B.en_US
dc.contributor.departmentMassachusetts Institute of Technology. Department of Mechanical Engineeringen_US
dc.identifier.oclc42004628en_US


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