Zone plate array lithography in the deep UV
Author(s)Djomehri, Ihsan Jahed, 1976-
Henry I. Smith.
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Initial design and development of a new paradigm in nanolithography, zone plate array lithography (ZPAL), has yielded a clearer understanding of its operation, construction, and performance. The benefits of ZPAL as a maskless strategy to write arbitrary patterns with ~ 25 nm resolution are explored. To optimize the properties of the system required proper design of zone plate focusing. Due to ZPAL's universality, the study has been conducted in the deep UV; a process to create zone plates with 250 nm theoretical spots sizes for this regime was developed. Familiarity with nanofabrication technology proved essential, especially e-beam lithography. Next, an optical setup was built replete with alignment interferometry, precision stage motion, and radiation from a 193 nm ArF laser. A rubric for the implementation of the multiplexing coupled with coordination architecture demonstrated a potentially high throughput of l cm2 / s. Moreover, the results of exposure tests show digital pattern generation from an array of beamlets. Because the ideal ZPAL system would function with x-rays, a discussion on its design and practical development has been included. Despite anticipated hurdles, spearheading this venture promises to drive lithography to its limit.
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1998.Includes bibliographical references (p. 47).
DepartmentMassachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Massachusetts Institute of Technology
Electrical Engineering and Computer Science