| dc.contributor.advisor | David L. Trumper. | en_US |
| dc.contributor.author | Williams, Mark E. (Mark Edd) | en_US |
| dc.date.accessioned | 2005-08-19T16:18:31Z | |
| dc.date.available | 2005-08-19T16:18:31Z | |
| dc.date.copyright | 1997 | en_US |
| dc.date.issued | 1998 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/9850 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1998. | en_US |
| dc.description | Includes bibliographical references (leaves 221-225). | en_US |
| dc.description.statementofresponsibility | by Mark Edd Williams. | en_US |
| dc.format.extent | 257 leaves | en_US |
| dc.format.extent | 15235679 bytes | |
| dc.format.extent | 15235432 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Mechanical Engineering | en_US |
| dc.title | Precision six degrees of freedom magnetically-levitated photolithography stage | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Mechanical Engineering | |
| dc.identifier.oclc | 41357016 | en_US |
