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Simulation and analysis of rarefied gas flows in chemical vapor deposition processes

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Simulation and analysis of rarefied gas flows in chemical vapor deposition processes

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Author: Coronell, Daniel G
Department: Massachusetts Institute of Technology. Dept. of Chemical Engineering
Publisher: Massachusetts Institute of Technology
Date Issued: 1993
Description:
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1993.Includes bibliographical references (leaves 288-300).
URI: http://hdl.handle.net/1721.1/12493
Keywords: Chemical Engineering

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