| dc.contributor.advisor | Klavis F. Jensen. | en_US |
| dc.contributor.author | Coronell, Daniel G | en_US |
| dc.date.accessioned | 2005-08-16T14:20:07Z | |
| dc.date.available | 2005-08-16T14:20:07Z | |
| dc.date.copyright | 1993 | en_US |
| dc.date.issued | 1993 | en_US |
| dc.identifier.uri | http://hdl.handle.net/1721.1/12493 | |
| dc.description | Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1993. | en_US |
| dc.description | Includes bibliographical references (leaves 288-300). | en_US |
| dc.description.statementofresponsibility | by Daniel Gene Coronell. | en_US |
| dc.format.extent | 301 leaves | en_US |
| dc.format.extent | 17826221 bytes | |
| dc.format.extent | 17825981 bytes | |
| dc.format.mimetype | application/pdf | |
| dc.format.mimetype | application/pdf | |
| dc.language.iso | eng | en_US |
| dc.publisher | Massachusetts Institute of Technology | en_US |
| dc.rights | M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. | en_US |
| dc.rights.uri | http://dspace.mit.edu/handle/1721.1/7582 | |
| dc.subject | Chemical Engineering | en_US |
| dc.title | Simulation and analysis of rarefied gas flows in chemical vapor deposition processes | en_US |
| dc.type | Thesis | en_US |
| dc.description.degree | Ph.D. | en_US |
| dc.contributor.department | Massachusetts Institute of Technology. Department of Chemical Engineering | |
| dc.identifier.oclc | 29948814 | en_US |
